scispace - formally typeset
J

J.S. Chang

Researcher at McMaster University

Publications -  7
Citations -  943

J.S. Chang is an academic researcher from McMaster University. The author has contributed to research in topics: Packed bed & Plasma. The author has an hindex of 5, co-authored 7 publications receiving 880 citations. Previous affiliations of J.S. Chang include Nagoya University.

Papers
More filters
Journal ArticleDOI

Corona discharge processes

TL;DR: In this paper, a review of applications of corona discharge induced plasmas and unipolar ions is presented, focusing on one of two aspects of the discharge: the ions produced or the energetic electrons producing the plasma.
Journal ArticleDOI

Ferro-electric pellet shape effect on C/sub 2/F/sub 6/ removal by a packed-bed-type nonthermal plasma reactor

TL;DR: In this article, the performance of perfluoroethane (C/sub 2/F/sub 6/) gas removal from simulated semiconductor process gas using packed-bed reactor are experimentally investigated.
Journal ArticleDOI

Atmospheric pressure of nitrogen plasmas in a ferroelectric packed-bed barrier discharge reactor. Part II. Spectroscopic measurements of excited nitrogen molecule density and its vibrational temperature

TL;DR: In this paper, the number density of the excited nitrogen molecules has been investigated by spectroscopic measurements at applied voltages from 0 to 20 kV, 60 Hz and gas flow rates from 1 to 5 L/min in pure nitrogen gas.
Journal ArticleDOI

Morphology of High-Frequency Electrohydraulic Discharge for Liquid-Solution Plasmas

TL;DR: In this article, the morphology of high-frequency electrohydraulic discharge for a liquid-solution plasma was investigated along with discharge morphology along with the fundamental nature and basic characteristics of this new type of plasma is relatively not well investigated.
Journal ArticleDOI

Scale-up of ferro-electric packed bed reactor for C2F6 decomposition

TL;DR: In this paper, BaTiO 3 ferro-electric pellet was used as BaTiOs to improve the removal efficiency of perfluoroethane (C 2 F 6 ) gas removal from simulated semiconductor process gas.