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Hiroshi Eda

Researcher at Ibaraki University

Publications -  112
Citations -  907

Hiroshi Eda is an academic researcher from Ibaraki University. The author has contributed to research in topics: Grinding & Wafer. The author has an hindex of 17, co-authored 112 publications receiving 850 citations. Previous affiliations of Hiroshi Eda include Toyota.

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Defect-free fabrication for single crystal silicon substrate by chemo-mechanical grinding

TL;DR: In this article, an alternative process has been developed by effective use of solid-state reaction between the CeO 2 abrasives and Si. The results show that the surface is generated by fixed abrasives following grinding dynamics, no defect or structural imperfection is introduced during fabrication and far better quality is achieved than that by CMP.
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Molecular dynamics simulation of friction on the atomic scale

TL;DR: In this article, several molecular dynamics simulations are performed, in order to clarify the atomic-scale stick-slip phenomenon which is commonly observed in the surface measurement using an atomic fine microscope (AFM).
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Simulation and experimental analysis of super high-speed grinding of ductile material

TL;DR: In this article, the work-affected layer of the machined surface by carrying out the grinding at the speed over static propagation speed of plastic wave of ductile materials and also aims to clarify such super high-speed machining mechanism.
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Material removal mechanism beyond plastic wave propagation rate

TL;DR: In this article, the authors investigated the cutting speed effect on the typical ductile metals of pure aluminum (A1199) and aluminum alloy (A5056), and revealed that static propagation rate is a breaking point from where the removal mechanism is different.
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Three-dimensional kinematical analyses for surface grinding of large scale substrate

TL;DR: In this article, an advanced machining system for ∅ 300mm silicon wafer, using fixed abrasive instead of conventional free slurry, was developed to provide a totally integrated solution for achieving the surface roughness.