Magnetron sputtering: a review of recent developments and applications

Spinels with the formula of AB2O4 (where A and B are metal ions) and the properties of magnetism, optics, electricity, and catalysis have taken significant roles in applications of data storage, biotechnology, electronics, laser, sensor, conversion reaction, and energy storage/conversion, which largely depend on their precise structures and compositions. In this review, various spinels with controlled preparations and their applications in oxygen reduction/evolution reaction (ORR/OER) and beyond are summarized. First, the composition and structure of spinels are introduced. Then, recent advances in the preparation of spinels with solid-, solution-, and vapor-phase methods are summarized, and new methods are particularly highlighted. The physicochemical characteristics of spinels such as their compositions, structures, morphologies, defects, and substrates have been rationally regulated through various approaches. This regulation can yield spinels with improved ORR/OER catalytic activities, which can furth...

Spinels: Controlled Preparation, Oxygen Reduction/Evolution Reaction Application, and Beyond

https://www.diva-portal.org/smash/get/diva2:17175/FULLTEXT02

Ionized physical vapor deposition (IPVD): A review of technology and applications

High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike. HPPMS, also known as HIPIMS (high power impulse ...

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

Transparent conducting electrodes are essential components for numerous flexible optoelectronic devices, including touch screens and interactive electronics. Thin films of indium tin oxide-the prototypical transparent electrode material-demonstrate excellent electronic performances, but film brittleness, low infrared transmittance and low abundance limit suitability for certain industrial applications. Alternatives to indium tin oxide have recently been reported and include conducting polymers, carbon nanotubes and graphene. However, although flexibility is greatly improved, the optoelectronic performance of these carbon-based materials is limited by low conductivity. Other examples include metal nanowire-based electrodes, which can achieve sheet resistances of less than 10Ω □(-1) at 90% transmission because of the high conductivity of the metals. To achieve these performances, however, metal nanowires must be defect-free, have conductivities close to their values in bulk, be as long as possible to minimize the number of wire-to-wire junctions, and exhibit small junction resistance. Here, we present a facile fabrication process that allows us to satisfy all these requirements and fabricate a new kind of transparent conducting electrode that exhibits both superior optoelectronic performances (sheet resistance of ~2Ω □(-1) at 90% transmission) and remarkable mechanical flexibility under both stretching and bending stresses. The electrode is composed of a free-standing metallic nanotrough network and is produced with a process involving electrospinning and metal deposition. We demonstrate the practical suitability of our transparent conducting electrode by fabricating a flexible touch-screen device and a transparent conducting tape.

/pdf/a-transparent-electrode-based-on-a-metal-nanotrough-network-3bf3ixxfu6.pdf

A transparent electrode based on a metal nanotrough network

Amorphous hydrogenerated carbon films containing a small amount of metal (Me:C-H) have been deposited by closed field unbalanced magnetron sputter ion plating. The films have graded film compositions to optimise the adhesion to the substrates, and multilayer TiC/Ti:C-H films have also been deposited. The films have excellent properties: very high measured microhardness (more than 4000 H v ), excellent adhesion ( L c 115–125 N), coefficients of friction against WC of less than 0.2, and volumetric wear rates one fifth that of titanium nitride. The coating procedure is ideally suited to the system used, and many applications for the films are already realised.

Deposition of wear resistant coatings based on diamond like carbon by unbalanced magnetron sputtering

The paper will outline the historical development of sputtering techniques up to the recent development of closed-field unbalanced magnetron sputtering (CFUBMS). Examples will then be given of the use of CFUBMS to develop advanced coatings for industrial applications, including corrosion resistant coatings for aerospace, hard ceramic coatings for wear resistance, and coatings with novel thermal and chemical properties. Finally, current development in the technology and in understanding of the principles of the process will be described.

Recent advances in magnetron sputtering

Using an energy-resolved mass spectrometer and a time-resolved Langmuir probe, the distribution of bombarding ion energies, their fluxes and energy fluxes at a substrate in an asymmetric bi-polar pulsed DC magnetron have been determined. The discharge was operated in Ar at a pressure of 0.53 Pa with a Ti target and pulsed DC frequencies of 100 and 350 kHz with a range of duty cycles (from 50 to 96%). At 100 kHz, the Ar+and Ti+ time-averaged ion energy distribution functions (IEDFs) reveal three peaks, which are at low energy (<10 eV), in a mid-range (20-50 eV) and at high energy (60-100 eV). We correlate these peaks with distinct phases of the discharge voltage. At 350 kHz the IEDFs show four peaks reflecting a more complex voltage waveform. The low-energy ions are generated in the `on' phase when the plasma potential is typically a few volts above ground. The Ti+ energy spectra show a remnant of the original sputter-neutral energy distribution function. The mid-range ions are produced in the quiescent region of the voltage reverse phase, when the plasma potential is raised globally a few volts above the cathode potential, typically 10-30 V. The high-energy ions are generated in a period of ~0.3 µs, during the discharge voltage overshoot, when the target potential rises to typically over +140 V. However, given the time resolution of the Langmuir probe (0.5 µs), it is not possible to determine if plasma potential is lifted globally to this high potential or only close to the cathode. At 350 kHz, these `fast' ions make up to about a quarter of the total ion flux at the substrate and an upper bound transient power flux of about 2.5 times the maximum delivered in the `on' phase. The total power flux to a substrate in the sustained phase of the discharge is found to increase with frequency and reverse time.

https://iopscience.iop.org/article/10.1088/0963-0252/11/2/307/pdf

R.D. Arnell

Papers

Magnetron sputtering: a review of recent developments and applications

Deposition of wear resistant coatings based on diamond like carbon by unbalanced magnetron sputtering

Recent advances in magnetron sputtering

The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge

The effect of substrate surface roughness on the wear of DLC coatings