Journal ArticleDOI
Magnetron sputtering: a review of recent developments and applications
Peter Kelly,R.D. Arnell +1 more
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TLDR
Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings, such as hard, wear-resistant, low friction, corrosion resistant, and decorative coatings as discussed by the authors.About:
This article is published in Vacuum.The article was published on 2000-03-01. It has received 1640 citations till now. The article focuses on the topics: High-power impulse magnetron sputtering & Sputter deposition.read more
Citations
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Spinels: Controlled Preparation, Oxygen Reduction/Evolution Reaction Application, and Beyond
TL;DR: The physicochemical characteristics of spinels such as their compositions, structures, morphologies, defects, and substrates have been rationally regulated through various approaches and can yield spinels with improved ORR/OER catalytic activities, which can further accelerate the speed, prolong the life, and narrow the polarization of fuel cells, metal-air batteries, and water splitting devices.
Journal ArticleDOI
Ionized physical vapor deposition (IPVD): A review of technology and applications
TL;DR: In this article, the development and application of magnetron sputtering systems for ionized physical vapor deposition (IPVD) is reviewed, and the application of a secondary discharge, inductively coupled plasma magnetron (ICP-MS), microwave amplified magnetron, and self-sustained sputtering (SSS) is discussed as well as the hollow cathode magnetron discharges.
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High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
Journal ArticleDOI
A transparent electrode based on a metal nanotrough network
Hui Wu,Desheng Kong,Zhichao Ruan,Po-Chun Hsu,Shuang Wang,Zongfu Yu,Thomas J. Carney,Liangbing Hu,Shanhui Fan,Yi Cui,Yi Cui +10 more
TL;DR: A new kind of transparent conducting electrode is produced that exhibits both superior optoelectronic performances and remarkable mechanical flexibility under both stretching and bending stresses.
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Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride
Jan Kischkat,Sven Peters,Bernd Gruska,Mykhaylo P. Semtsiv,Mikaela Chashnikova,Matthias Klinkmüller,O. Fedosenko,S. Machulik,A. Aleksandrova,Gregorii Monastyrskyi,Yuri V. Flores,W. Ted Masselink +11 more
TL;DR: The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously, and allows conclusions to be drawn on the degree of amorphousness and roughness.
References
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Journal ArticleDOI
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
TL;DR: Two cylindrically symmetric and complementary sputtering geometries, the post and hollow cathodes, were used to deposit thick coatings of various metals (Mo, Cr, Ti, Fe, Cu, and Al-alloy) onto glass and metallic substrates at deposition rates of 1000-2000 A/min under various conditions of substrate temperature, argon pressure, and plasma bombardment as mentioned in this paper.
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Revised structure zone model for thin film physical structure
TL;DR: In this paper, the structure zone models, previously developed to classify the larger sized physical structures, are revised to account for the evolutionary growth stages of structure development as well as the separate effects of thermal and bombardment induced mobility.
Journal ArticleDOI
Charged particle fluxes from planar magnetron sputtering sources
B. Window,Nick Savvides +1 more
TL;DR: In this article, the charged particle fluxes from circular planar magnetrons with different magnetic field configurations were investigated and the authors reported measurements of the currents to earthed substrates, the substrate self-biasing voltages, the ion currents to substrates at −100 V, and deposition rates as functions of axial and radial positions with respect to the target.