Jaeyoung Park

TL;DR: In this paper, the physics and chemistry of the plasma jet and other atmospheric pressure sources are reviewed, including transferred arcs, plasma torches, corona discharges, and dielectric barrier discharges.

TL;DR: In this paper, a plasma jet was developed for etching materials at atmospheric pressure and between 100 and C. Gas mixtures containing helium, oxygen and carbon tetrafluoride were passed between an outer, grounded electrode and a centre electrode, which was driven by 13.56 MHz radio frequency power at 50 to 500 W. At a flow rate of, a stable, arc-free discharge was produced.

TL;DR: In this article, a plasma jet was developed which deposits silica films at up to at 760 Torr and 115 to C. The jet operates by feeding oxygen and helium gas between two coaxial electrodes, driven by a 13.56 MHz radio frequency source at 40 to 500 W. Tetraethoxysilane is mixed with the effluent of the plasma jet and directed onto a substrate located 1.7 cm downstream.

TL;DR: In this paper, an atmospheric pressure plasma source operated by radio frequency power has been developed, which produces a unique discharge that is volumetric and homogeneous at atmospheric pressure with a gas temperature below 300 °C.

TL;DR: In this paper, the afterglow of a non-equilibrium, capacitive discharge, operated at 600 Torr total pressure with (0.5 to 5.0) × 1017 cm-3 of oxygen in helium, has been examined by ultraviolet absorption spectroscopy, optical emission spectro-opy, and numerical modeling.