J
J. Kedzierski
Researcher at University of California, Berkeley
Publications - 10
Citations - 3196
J. Kedzierski is an academic researcher from University of California, Berkeley. The author has contributed to research in topics: MOSFET & Short-channel effect. The author has an hindex of 10, co-authored 10 publications receiving 3031 citations.
Papers
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Journal ArticleDOI
FinFET-a self-aligned double-gate MOSFET scalable to 20 nm
Digh Hisamoto,Wen-Chin Lee,J. Kedzierski,Hideki Takeuchi,K. Asano,C. Kuo,Erik H. Anderson,Tsu-Jae King,Jeffrey Bokor,Chenming Hu +9 more
TL;DR: In this paper, a self-aligned double-gate MOSFET, FinFET was proposed by using boron-doped Si/sub 04/Ge/sub 06/ as a gate material.
Proceedings ArticleDOI
Sub 50-nm FinFET: PMOS
Xuejue Huang,Wen-Chin Lee,C. Kuo,D. Hisamoto,Leland Chang,J. Kedzierski,E. Anderson,Hideki Takeuchi,Yang-Kyu Choi,K. Asano,Vivek Subramanian,Tsu-Jae King,Jeffrey Bokor,Chenming Hu +13 more
TL;DR: In this article, a self-aligned double-gate MOSFET structure (FinFET) is used to suppress the short channel effect, and a 45 nm gate-length PMOS FinEET is presented.
Journal ArticleDOI
Sub-50 nm P-channel FinFET
Xuejue Huang,Wen-Chin Lee,C. Kuo,Digh Hisamoto,Leland Chang,J. Kedzierski,Erik H. Anderson,Hideki Takeuchi,Yang-Kyu Choi,K. Asano,Vivek Subramanian,Tsu-Jae King,Jeffrey Bokor,Chenming Hu +13 more
TL;DR: In this article, a self-aligned double-gate MOSFET structure (FinFET) is used to suppress the short-channel effects, which shows good performance down to a gate-length of 18 nm.
Proceedings ArticleDOI
Complementary silicide source/drain thin-body MOSFETs for the 20 nm gate length regime
TL;DR: In this article, thin-body transistors with silicide source/drains were fabricated with gate-lengths down to 15 nm and complementary low-barrier silicides were used to reduce contact and series resistance.
Journal ArticleDOI
Nanoscale ultra-thin-body silicon-on-insulator P-MOSFET with a SiGe/Si heterostructure channel
Yee Chia Yee,Vivek Subramanian,J. Kedzierski,Peiqi Xuan,Tsu-Jae King,Jeffrey Bokor,Chenming Hu +6 more
TL;DR: In this article, the concept and demonstration of a nanoscale ultra-thin-body silicon on-insulator (SOI) P-channel MOSFET with a Si/sub 1-x/Ge/sub x/Si heterostructure channel was presented.