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Qi-Kun Xue

Researcher at Tsinghua University

Publications -  618
Citations -  35623

Qi-Kun Xue is an academic researcher from Tsinghua University. The author has contributed to research in topics: Scanning tunneling microscope & Topological insulator. The author has an hindex of 84, co-authored 589 publications receiving 30908 citations. Previous affiliations of Qi-Kun Xue include Nanjing University of Information Science and Technology & Chinese Academy of Sciences.

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Experimental Observation of the Quantum Anomalous Hall Effect in a Magnetic Topological Insulator

TL;DR: The observation of the quantum anomalous Hall (QAH) effect in thin films of chromium-doped (Bi,Sb)2Te3, a magnetic topological insulator shows a plateau in the Hall resistance as a function of the gating voltage without any applied magnetic fields, signifying the achievement of the QAH state.
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Crossover of the three-dimensional topological insulator Bi 2 Se 3 to the two-dimensional limit

TL;DR: In this article, a study of the topological insulating Bi2Se3 thin films finds that a gap in these gapless surface states opens up in films below a certain thickness, which suggests that in thicker films, gapless states exist on both upper and lower surfaces.
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Interface-Induced High-Temperature Superconductivity in Single Unit-Cell FeSe Films on SrTiO3

TL;DR: In this paper, the authors reported high transition temperature superconductivity in one unitcell (UC) thick FeSe films grown on a Se-etched SrTiO3 (001) substrate by molecular beam epitaxy (MBE).
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Superconductivity above 100 K in single-layer FeSe films on doped SrTiO3

TL;DR: FeSe/STO is confirmed as an ideal material for studying high-Tc superconductivity by means of in situ four-point probe electrical transport measurements, and rekindle the long-standing idea that electron pairing at interfaces between two different materials can be tailored to achieve high-temperaturesuperconductivity.
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Toward N-Doped Graphene via Solvothermal Synthesis

TL;DR: In this paper, a method for one-pot direct synthesis of N-doped graphene via the reaction of tetrachloromethane with lithium nitride under mild conditions, which renders fabrication in gram scale.